| 单词 | dry plasma etching |
| 释义 | dry plasma etchingdry plasma etching[¦drī ′plaz·mə]dry plasma etchingA method for inscribing a pattern on a wafer by shooting hot ions through a mask to evaporate the silicon dioxide insulation layer. Dry plasma etching replaces the wet processing method that uses film and acid for developing the pattern. |
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