| 释义 |
DictionarySeeelectron beamelectron beam lithography
electron beam lithographyUsing electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks.
 | | Magnified 35,000 Times |
|---|
| The tiny lines on this silicon wafer were created using Lucent's SCALPEL electron beam lithography. The right-leaning lines are .08 microns wide. It would take 1,250 of them to equal the width of one human hair. (Image courtesy of Lucent Technologies.) |
AcronymsSeeEBL |