释义 |
physical vapor deposition
physical vapor deposition[‚fiz·i·kəl ′vā·pər ‚dep·ə‚zish·ən] (materials) A thin-film deposition process in which a material (metal, alloy, compound, cermet, or composite) is either evaporated or sputtered onto a substrate in a vacuum. Abbreviated PVD. AcronymsSeePVD |