photomaskn.
/ˈfəʊtə(ʊ)mɑːsk/, /ˈfəʊtə(ʊ)mask/, U.S. /ˈfoʊdəˌmæsk/ Science and Manufacturing Technology.
A photographic pattern through which a photoresist or photoreactive material is irradiated with ultraviolet light in order to transfer the pattern to it prior to selective removal of substrate material.
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the world > matter > physics > electromagnetic radiation > electronics > electronic phenomena > electronic circuit > [noun] > masks used in making microcircuits
mask1956
photomask1963
1963 Science 6 Dec. 1385/1 Production of precise photomasks for semiconductor integrated circuits.
1977 Sci. Amer. Sept. 114/3 Each photomask, typically a glass plate about five inches on a side, has a single pattern repeated many times over its surface.
1993 Fortune 8 Feb. 27/3 This company produces photomasks, the master plates that are used to make semi-conductor wafers.
1995 Jrnl. Biomed. Materials Res. 29 749 The photochemical fixation of these photoreactive polymers consisted of three steps: 1) coating of a photoreactive polymer on a material surface, 2) ultraviolet irradiation through a photomask, and 3) removal of nonreacted polymer by a solvent.
2003 Electrophoresis 24 3755 Semicircular grooves on glass wafers are obtained using a photomask with a narrow line-width.
This entry has been updated (OED Third Edition, March 2006; most recently modified version published online March 2022).
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n.1963