EUVadj.n.
/ˌiːjuːˈviː/, U.S. /ˌiˌjuˈvi/ A. adj.
Designating high energy ultraviolet radiation, typically of wavelengths between 10 and 124 nanometres; of, relating to, or utilizing radiation of this kind.
ΚΠ
1933 Physical Rev. 44 892/1 The EUV radiation available is small compared with the visible, infrared and heat rays.
1965 Annales d'Astrophysique 28 453/2 The three EUV emission lines for which data are given display individual features which vary from one line to another.
1989 New Scientist 30 Sept. 57 This detector has a surface coating..that emits electrons when struck by EUV light.
2012 Philos. Trans. (Royal Soc.) A. 370 5217 These heating rates are one or two orders of magnitude greater than that produced by the absorption of solar EUV radiation by the upper atmosphere.
B. n.
1. High energy ultraviolet radiation, typically of wavelengths between 10 and 124 nanometres.
ΚΠ
1956 H. E. Hinteregger in J. A. van Allen Sci. Uses of Earth Satellites xix. 166 The energy range covered by all the infrared, visible, and near ultraviolet radiation together is truly quite small as compared with that of the E.U.V.
1988 Jrnl. Atmospheric & Terrestr. Physics 50 207/1 To predict solar cycle..variations in electron density, it is ideal to have measured values of EUV and X-rays over long periods.
2017 P. Fabbri & M. Messori in C. F. Jasso-Gastinel & J. M. Kenny Modification of Polymer Properties v. 118/2 EUV is high-energy UV radiation, having photons with energies ranging from 10 up to 124eV.
2. EUV lithography.
ΘΚΠ
society > leisure > the arts > visual arts > printmaking > surface and planographic printing > lithography > [noun] > types of
autography1828
chromolithography1839
lithochromatography1843
lithochrysography1845
lithochromatic1846
lithochrome1854
oleography1870
autolithography1874
lithochromy1885
tin printing1887
typo-etching1888
transfer-lithography1897
EUV1995
1995 M. Wei Grating-based Soft X-ray Spatial Frequency Multiplication (D.Phil. thesis, Univ. of Calif.) iv. 70 The wavelength presently favored for ‘extreme ultraviolet’ lithography (EUV) is λ=13 nm.
2016 IEEE Spectrum Nov. 32 (caption) EUV promises to create sharper shapes..than those that can be created through multiple patterning with today's 193-nanometer light.
Compounds
EUV lithography n. Electronics a (proposed) method of lithography (lithography n. Additions) using radiation of wavelengths falling in the extreme ultraviolet range (esp. 13.5 nanometres).
ΚΠ
1994 Microelectronic Engin. 23 279 (header) Silylated positive tone resists for EUV lithography at 14 nm.
2015 P. Di Lazzaro et al. in D. Bleiner et al. Short Wavelength Lab. Sources 277 The most studied gas for debris mitigation has been argon, as it is relatively transparent at 13.5 nm, the wavelength of choice for EUV lithography.
This entry has been updated (OED Third Edition, January 2018; most recently modified version published online March 2022).
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adj.n.1933